Nikon optical microscope
About
Process: This is a standard upright optical microscope from Nikon used for routine visual inspection, pattern verification, and basic sample characterization in the cleanroom. It provides clear brightfield imaging for quick assessment of fabricated features and surfaces.
Hardware: Nikon upright microscope body (specific model/series not listed). Brightfield illumination with Dyna Lite 150 light source. Binocular or trinocular head for comfortable viewing (camera port if equipped). Multiple objectives for variable magnification. Manual stage for sample positioning. Cleanroom-compatible design.
Key Features:
- Illumination: Dyna Lite 150 light source (external or integrated)
- Viewing: Binocular head (trinocular/camera port possible – confirm on tool)
- Magnification: Dependent on objectives (typically 5x–100x range – confirm available set)
- Sample compatibility: Wafers, pieces, or mounted samples
Applications:
- Quick inspection of lithographic patterns and alignment marks
- Defect detection (particles, scratches, contamination)
- Verification of etch profiles, deposition uniformity, or bonding quality
- General sample viewing after processing steps
- Documentation support (if camera attached)
Usage: Place sample on stage, adjust focus and illumination (Dyna Lite 150), select objective, view through eyepieces, capture notes or images if camera present. Clean sample/stage after use.
Detailed Specifications
- Model: Nikon Optical Microscope (specific series unknown)
- Location: Advanced Photo Bay
- Illumination: Dyna Lite 150 light source
- Features: Brightfield imaging, cleanroom-compatible, ergonomic design
- Restrictions: Limited to optical inspection (no SEM-level resolution); confirm available objectives and any contrast modes (e.g., darkfield/polarized) on tool
- Other: General-purpose microscope for routine inspection and teaching
Documentation
- Training required – contact lab staff (Chandan Ramakrishnaiah or Shivakumar Bhaskaran)
- Check lab resources for any existing quick guide or manual (no dedicated SOP file listed; consider creating one if needed)
Recipes & Data
- Standard Usage: Common tasks include:
* Pattern inspection: 10x–50x for general features * Defect review: 20x–100x for particles or edge quality * Process check: Quick visual assessment after lithography/etch
- Process Control: Use consistent lighting for repeatable viewing. Compare with higher-resolution tools (SEM, profilometer) for detailed analysis.
- Notes: Clean lenses and stage regularly. Adjust Dyna Lite 150 for optimal contrast (direct or diffused). If trinocular, use camera for documentation.
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