Imtec Accubath
About
Process: This is a temperature-controlled chemical bath designed for precise heating of acids, bases, and cleaning solutions. It is the only bath in the lab approved for Piranha (H₂SO₄/H₂O₂) and Nanostrip use, making it critical for organic residue removal, photoresist stripping, and wafer cleaning.
Hardware: Imtec Accubath series tank with integrated heater and digital temperature controller. Acid-resistant construction (likely PTFE or quartz liner). Overflow or level control. Located exclusively in the left-side acid fume hood (Etch Bay) where Piranha and Nanostrip are permitted. Safety interlocks and spill containment.
Key Features:
- Temperature-controlled heating
- Approved for Piranha and Nanostrip
- Acid-resistant materials
- Precise digital temperature setpoint
Applications:
- Piranha clean (organic removal, surface activation)
- Nanostrip photoresist removal
- Acid-based wafer cleaning and surface preparation
- Heating of other compatible etchants or strippers
- Pre-treatment before deposition or bonding
Usage: Fill bath with approved chemical (Piranha or Nanostrip only in this unit), set temperature, allow stabilization, immerse sample (wafer holder or cassette), time process, remove and rinse in QDR. Follow strict safety protocols (PPE, fume hood sash down, no mixing of incompatible chemicals). Never use Piranha/Nanostrip in other hoods.
Detailed Specifications
- Model: Imtec Accubath
- Location: Acid Fume Hood – Left (Etch Bay)
- Features: Heated chemical bath, digital temperature control, acid-resistant construction
- Approved chemicals: Piranha (H₂SO₄/H₂O₂), Nanostrip (and other compatible acid solutions)
- Restrictions: Piranha and Nanostrip **only allowed in this left-side hood**; no organic solvents or bases here; never mix chemicals in bath
- Other: Critical safety tool for strong oxidative cleaning processes
Documentation
- SOP – Etch Bay Fume Hoods (includes Accubath usage)
- Training required – contact lab staff (Chandan Ramakrishnaiah or Shivakumar Bhaskaran)
Recipes & Data
- Standard Processes: Common uses include:
* Piranha clean: 120–140°C, 10–30 min (organic removal, hydroxylate surface) * Nanostrip: Typically room temp to 60–80°C, 5–60 min (photoresist strip) * Temperature stabilization: Allow 30–60 min to reach setpoint
- Process Control: Monitor temperature stability. Use timer for consistent exposure. Rinse thoroughly in QDR after removal. Dispose of waste per lab chemical protocols.
- Notes: Always prepare Piranha fresh (never store). Wear full acid PPE. Never add water to acid (add acid to water if mixing). This is the **only** hood/bath for Piranha/Nanostrip.