Torrey Pines hot plate / stirrer

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About

Torrey Pines HS70 Hot Plate / Stirrer in E-beam Resist Fume Hood (Photo Bay)

Process: This is a digital hot plate with integrated magnetic stirrer used for controlled heating and mixing of solutions in the e-beam resist workflow. It provides precise temperature regulation and stirring for consistent preparation of resists, developers, or other liquids before coating or processing.

Hardware: Torrey Pines HS70 series hot plate/stirrer with flat heating surface. Digital temperature controller (ambient to ~400°C – confirm max on unit). Variable magnetic stir speed (typically 100–1500 rpm). Ceramic or aluminum top plate for even heating. Safety features (over-temperature cutoff, hot surface warning). Located in the e-beam resist fume hood for safe solvent handling.

Key Features:

  • Precise digital temperature control
  • Magnetic stirring with adjustable speed
  • Compact design for fume hood use
  • Safety over-temp protection and isolated controls

Applications:

  • Heating and stirring of e-beam resist solutions (e.g., PMMA, ZEP dilution or mixing)
  • Preparation of developers or adhesion promoters
  • Gentle warming of solvents before dispense
  • Dissolving or homogenizing small volumes of chemicals
  • Pre-heating for spin-coating or immersion processes

Usage: Place beaker or container on plate (use stir bar if mixing), set temperature and stir speed, monitor process, turn off and allow cooling before handling. Use in fume hood only. Never leave unattended at high temperatures. Clean surface after use.

Detailed Specifications

  • Model: Torrey Pines HS70 (hot plate / stirrer)
  • Location: E-beam Resist Fume Hood – Photo Bay
  • Temperature range: Ambient to high temperature (confirm max on unit, typically ~400°C)
  • Stirring: Magnetic, variable speed (typically 100–1500 rpm)
  • Features: Digital controls, safety over-temp protection, compact for fume hood
  • Restrictions: Use only in designated e-beam resist hood; avoid strong corrosives or incompatible solvents; do not exceed solvent boiling/flash points
  • Other: Supports precise solution prep for high-resolution e-beam lithography

Documentation

Recipes & Data

  • Standard Usage: Common tasks include:
 * E-beam resist mixing: 40–60°C with 300–800 rpm stirring (e.g., PMMA in anisole)
 * Developer warming: 30–50°C, low/no stir (e.g., MIBK:IPA for PMMA)
 * Solvent pre-heating: 40–70°C (e.g., IPA, anisole before dispense)
  • Process Control: Monitor temperature stability. Use thermocouple if critical precision needed. Avoid boiling solvents with low flash points.
  • Notes: Always use fume hood ventilation. Use glass or solvent-compatible containers. Turn off when not in use. Clean surface with IPA after each use to prevent cross-contamination.