Zeiss optical microscope
About
Process: This is a high-quality upright optical microscope from Zeiss designed for detailed visual inspection and characterization of fabricated structures in the cleanroom. It provides excellent image clarity and contrast, suitable for routine sample review, defect identification, and process verification.
Hardware: Zeiss binocular or trinocular head (likely with high-resolution optics). Brightfield illumination standard (darkfield/polarized/DIC possibly available – confirm on tool). Multiple objectives for a range of magnifications. Manual stage for sample positioning. Cleanroom-compatible design with ergonomic controls.
Key Features:
- Optics: High-quality Zeiss objectives and eyepieces (magnification range confirm on tool, typically 5x–100x)
- Illumination: Brightfield (halogen or LED; additional modes if equipped)
- Viewing: Binocular or trinocular for comfortable extended use
- Sample compatibility: Wafers, pieces, or mounted samples
Applications:
- Inspection of lithographic patterns, etch profiles, and defects
- Verification of alignment marks and overlay
- Surface quality check after deposition or polishing
- Documentation of microstructures or process results
- Quick visual assessment of small samples or test devices
Usage: Place sample on stage, adjust focus and illumination, select objective, view through eyepieces (or trinocular camera if attached), capture notes or images if camera present. Clean sample/stage after use.
Detailed Specifications
- Model: Zeiss Optical Microscope (specific series not listed)
- Location: Advanced Photo Bay
- Features: High-resolution Zeiss optics, brightfield illumination, cleanroom-compatible, ergonomic design
- Restrictions: Limited to optical inspection (no SEM-level resolution); confirm available objectives and contrast modes on tool
- Other: Reliable, high-quality microscope for routine inspection and documentation
Documentation
- Training required – contact lab staff (Chandan Ramakrishnaiah or Shivakumar Bhaskaran)
- Check lab resources for any existing quick guide or manual (no dedicated SOP file listed; consider creating one if needed)
Recipes & Data
- Standard Usage: Common tasks include:
* Pattern inspection: 10x–50x for general features * Defect review: 50x–100x for particles, scratches, or edge roughness * Alignment check: High-mag viewing of overlay marks
- Process Control: Use consistent lighting and focus for repeatable visual assessment. Compare with SEM for sub-micron details if needed.
- Notes: Clean lenses and stage regularly. Adjust illumination for optimal contrast (brightfield for general use). If trinocular, use camera for documentation.
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