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{| class="wikitable" style="width:min-content;"
{| class="wikitable" style="width:min-content;"
|
|
=== Tool Categories ===
=== Tool Categories ===
* [[#Anneal-&-Furnace|Anneal & Furnace]]
* [[#Anneal & Furnace|Anneal & Furnace]]
* [[#Deposition|Deposition]]
* [[#Deposition|Deposition]]
* [[#Dry-Etching-&-Plasma-Cleaning|Dry Etching & Plasma Cleaning]]
* [[#Dry Etching & Plasma Cleaning|Dry Etching & Plasma Cleaning]]
* [[#Lithography|Lithography]]
* [[#Lithography|Lithography]]
* [[#Metrology|Metrology]]
* [[#Metrology|Metrology]]
* [[#Packaging-&-Mechanical-Tooling|Packaging & Mechanical Tooling]]
* [[#Packaging & Mechanical Tooling|Packaging & Mechanical Tooling]]
* [[#PCB-Processing|PCB Processing]]
* [[#PCB Processing|PCB Processing]]
* [[#Wet-Process|Wet Process]]
* [[#Wet Process|Wet Process]]
|}
|}


= Anneal & Furnace = {#Anneal-&-Furnace}
= Anneal & Furnace =
* Rapid Thermal Annealer (RTA)
* [[#RTA|RTA (Rapid Thermal Annealer)]]
* Cascade Tek Vacuum Oven
* [[#Cascade Tek vacuum oven|Cascade Tek vacuum oven]]
* Blue M Furnace (Large)
* [[#Blue M furnace big|Blue M furnace big]]
* Blue M Furnace (Small)
* [[#Blue M furnace little|Blue M furnace little]]
* Narco Vacuum Oven
* [[#Narco vacuum oven|Narco vacuum oven]]
 
= Deposition =
 
== CVD ==
* [[#Oxford PECVD|Oxford PECVD]]
* [[#Veeco ALD|Veeco ALD]]
 
== PVD ==
* [[#Angstrom Evaporator|Angstrom Evaporator]]
* [[#CHA Evaporator|CHA Evaporator]]
* [[#KJL Evaporator|KJL Evaporator]]
* [[#Temescal Metal e-beam evaporator|Temescal Metal e-beam evaporator]] (not in service)
* [[#KJL Sputter|KJL Sputter]]
 
= Dry Etching & Plasma Cleaning =


= Deposition = {#Deposition}
== Etchers ==
===== Chemical Vapor Deposition (CVD) =====
* [[#Oxford DRIE|Oxford DRIE]]
* Oxford PECVD
* [[#Oxford DRIE-ALE|Oxford DRIE-ALE]] (commissioning in progress)
* Veeco ALD
* [[#Oxford III-V|Oxford III-V]]
* [[#Oxford RIE|Oxford RIE]]
* [[#XeF2 etcher|XeF2 etcher]]


===== Physical Vapor Deposition (PVD) =====
== Plasma cleaning / ashing ==
* Angstrom E-Beam Evaporator
* [[#Tegal O2 Plasma Asher|Tegal O2 Plasma Asher]]
* CHA E-Beam Evaporator
* [[#Tegal Plasma|Tegal Plasma]] (not in operation)
* KJL E-Beam Evaporator
* [[#YES O2 Plasma|YES O2 Plasma]]
* Temescal E-Beam Evaporator (Not in service)
* KJL Sputter System


= Dry Etching & Plasma Cleaning = {#Dry-Etching-&-Plasma-Cleaning}
= Lithography =
===== Reactive Ion / Deep Reactive Ion Etchers =====
* Oxford DRIE (Deep Si Etcher)
* Oxford DRIE-ALE (Atomic Layer Etcher – commissioning)
* Oxford III-V Etcher (PlasmaPro 100 Cobra)
* Oxford RIE (PlasmaPro 80 – Dielectrics)
* XeF₂ Etcher


===== Plasma Cleaning / Ashing =====
== E-beam and laser ==
* Tegal O₂ Plasma Asher
* [[#Raith EBL|Raith EBL]]
* Tegal Plasma Cleaner (Not in operation)
* [[#Heidelberg DWL|Heidelberg DWL]]
* YES O₂ Plasma System


= Lithography = {#Lithography}
== UV mask aligners ==
===== Direct-Write / Maskless =====
* [[#Aligner A (MJB3)|Aligner A (MJB3)]]
* Raith EBPG5150 Electron Beam Lithography
* [[#Aligner B (MJB3)|Aligner B (MJB3)]]
* Heidelberg DWL 66+ Direct Write Laser
* [[#Aligner C (MJB4)|Aligner C (MJB4)]]
* [[#Aligner D (MA BA6 Gen4)|Aligner D (MA BA6 Gen4)]]


===== Contact / Proximity Mask Aligners =====
= Metrology =
* Aligner A – SUSS MJB3 (Advanced Photo Bay)
* Aligner B – SUSS MJB3 (Photo Bay)
* Aligner C – SUSS MJB4 (Photo Bay)
* Aligner D – SUSS MA/BA6 Gen4 (Advanced Photo Bay)


= Metrology = {#Metrology}
== Assorted metrology ==
===== Thin-Film & Electrical =====
* [[#4-point Probe|4-point Probe]]
* 4-Point Probe
* [[#Dektak profilometer|Dektak profilometer]]
* DektakXT Profilometer
* [[#Ellipsometer|Ellipsometer]]
* Ellipsometer
* [[#Filmetrics F20|Filmetrics F20]]
* Filmetrics F20 Thin-Film Analyzer


===== Microscopy =====
== Microscopes ==
* Phenom ProX Desktop SEM
* [[#Desktop SEM|Desktop SEM]]
* Nikon LV150 Optical Microscope
* [[#Nikon LV 150 optical microscope|Nikon LV 150 optical microscope]]
* Max ERB Optical Microscope
* [[#Max ERB optical microscope|Max ERB optical microscope]]
* Zeiss Optical Microscope
* [[#Zeiss optical microscope|Zeiss optical microscope]]
* Nikon SMZ-10A Stereo Microscope
* [[#Nikon SMZ-10A optical microscope|Nikon SMZ-10A optical microscope]]
* Nikon Optical Microscope (unspecified model)
* [[#Nikon optical microscope|Nikon optical microscope]]


= Packaging & Mechanical Tooling = {#Packaging-&-Mechanical-Tooling}
= Packaging & Mechanical Tooling =
* F&S Bondtec Ball & Wedge Wire Bonder
* DISCO DAD3350 Dicing Saw
* EQ Unipol-300 Mini Polisher / Grinder
* LatticeAx 420 Cleaving System
* LatticeGear FlipScribe Wafer Cleaver
* Gramatech Vacuum Bag Sealer


= PCB Processing = {#PCB-Processing}
== Wafer and die processing ==
* LPKF ProtoMat S103 PCB Mill
* [[#Ball & Wedge bonder|Ball & Wedge bonder]]
* LPKF Contac S4 Electroplater
* [[#Dicing Saw|Dicing Saw]]
* [[#Mini Polisher|Mini Polisher]]
* [[#LatticeAx Cleaver|LatticeAx Cleaver]]
* [[#FlipScribe Cleaver|FlipScribe Cleaver]]
* [[#Vacuum Bag Sealer|Vacuum Bag Sealer]]


= Wet Process = {#Wet-Process}
= PCB Processing =
===== Solvent Fume Hood (Metrology Bay) =====
* [[#LPKF PCB mill|LPKF PCB mill]]
* Heated Ultrasonic Bath
* [[#LPKF electroplater|LPKF electroplater]]
* Torrey Pines Hot Plate
* Solvent Drains
* N₂ Blow Guns


===== Acid Fume Hood – Left Side (Etch Bay) =====
= Wet Process =
* Imtec Heated Bath
* Quick-Dump-Rinse (QDR) Tank
* DI Water Tap
* N₂ Gun


===== Acid Fume Hood – Right Side (Etch Bay) =====
== Solvent fume hood (Metrology bay) ==
* Imtec Heated Bath
* Heated ultrasonic bath
* Torrey Pines Hot Plate (Left)
* Torrey Pines hot plate / stirrer
* Torrey Pines Hot Plate (Right)
* Solvent drains
* Quick-Dump-Rinse (QDR) Tank
* N2 sprayers
* DI Water Tap
* N₂ Sprayer


===== Resist Coating / Baking Fume Hood (Advanced Photo Bay) =====
== Acid fume hood left (Etch bay) ==
* Laurell Spinner – Left
* Heated bath (Imtec Accubath)
* Laurell Spinner – Right
* Quick-dump-rinse tank (QDR)
* Apogee Bake Plate 1
* DI water tap
* Apogee Bake Plate 2
* N2 gun
* Apogee Bake Plate 3
* Apogee Bake Plate 4


===== Developer / Base Fume Hood – Left Side (Advanced Photo Bay) =====
== Acid fume hood right (Etch bay) ==
* Imtec Heated Bath
* Heated bath (Imtec Accubath)
* Torrey Pines Hot Plate
* Torrey Pines hot plate left
* Quick-Dump-Rinse (QDR) Tank
* Torrey Pines hot plate right
* DI Water Tap
* Quick-dump-rinse tank (QDR)
* N₂ Sprayer
* DI water tap
* N2 sprayer


===== Developer / Base Fume Hood – Right Side (Advanced Photo Bay) =====
== Resist fume hood (Advanced Photo bay) ==
* Imtec Heated Bath
* Spinner left (Laurell)
* Torrey Pines Hot Plate
* Spinner right (Laurell)
* Quick-Dump-Rinse (QDR) Tank
* Bake plate 1 (Apogee)
* DI Water Tap
* Bake plate 2 (Apogee)
* N₂ Sprayer
* Bake plate 3 (Apogee)
* Bake plate 4 (Apogee)


===== E-Beam Resist Fume Hood (Photo Bay) =====
== Base and developer fume hoods (Advanced Photo bay) ==
* Headway Spinner – Left
* Heated bath (Imtec Accubath)
* Headway Spinner – Right
* Torrey Pines hot plate
* Apogee Hot Plate – Left
* Quick-dump-rinse tank (QDR)
* Apogee Hot Plate – Right
* DI water tap
* Ultrasonic Heated Bath
* N2 sprayer
* Torrey Pines Hot Plate / Stirrer


== Decommissioned Tools ==
== E-beam resist fume hood (Photo bay) ==
(None currently listed)
* Headway spinner left
* Headway spinner right
* Apogee hot plate left
* Apogee hot plate right
* Ultrasonic heated bath
* Torrey Pines hot plate / stirrer

Revision as of 13:36, 2 February 2026


Tool Categories

Anneal & Furnace

Deposition

CVD

PVD

Dry Etching & Plasma Cleaning

Etchers

Plasma cleaning / ashing

Lithography

E-beam and laser

UV mask aligners

Metrology

Assorted metrology

Microscopes

Packaging & Mechanical Tooling

Wafer and die processing

PCB Processing

Wet Process

Solvent fume hood (Metrology bay)

  • Heated ultrasonic bath
  • Torrey Pines hot plate / stirrer
  • Solvent drains
  • N2 sprayers

Acid fume hood left (Etch bay)

  • Heated bath (Imtec Accubath)
  • Quick-dump-rinse tank (QDR)
  • DI water tap
  • N2 gun

Acid fume hood right (Etch bay)

  • Heated bath (Imtec Accubath)
  • Torrey Pines hot plate left
  • Torrey Pines hot plate right
  • Quick-dump-rinse tank (QDR)
  • DI water tap
  • N2 sprayer

Resist fume hood (Advanced Photo bay)

  • Spinner left (Laurell)
  • Spinner right (Laurell)
  • Bake plate 1 (Apogee)
  • Bake plate 2 (Apogee)
  • Bake plate 3 (Apogee)
  • Bake plate 4 (Apogee)

Base and developer fume hoods (Advanced Photo bay)

  • Heated bath (Imtec Accubath)
  • Torrey Pines hot plate
  • Quick-dump-rinse tank (QDR)
  • DI water tap
  • N2 sprayer

E-beam resist fume hood (Photo bay)

  • Headway spinner left
  • Headway spinner right
  • Apogee hot plate left
  • Apogee hot plate right
  • Ultrasonic heated bath
  • Torrey Pines hot plate / stirrer
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