Tool list

Annealing

Tool	Description
RTA	Rapid Thermal Annealer

Deposition

CVD (chemical vapor deposition)

Tool	Description
Veeco ALD	Atomic Layer Deposition
Oxford PECVD	Plasma-enhanced chemical vapor deposition

PVD (physical vapor deposition)

Tool	Description
Angstrom Evaporator	Angstrom Engineering e-beam evaporator
CHA Evaporator	CHA Industries e-beam evaporator
KJL Evaporator	Kurt J. Lesker e-beam evaporator
Temescal Metal	Temescal e-beam evaporator
KJL Sputter	Kurt J. Lesker sputterer

Lithography

E-beam lithography

Tool	Description
Raith EBL	Raith e-beam lithography EBPG5150

Laser writing

Tool	Description
Heidelberg DWL	Heidelberg DWL 66+ (Direct Write Laser)

Aligners

Tool	Description
Aligners A and B (MJB3)	MJB3 aligner
Aligner C (MJB4)	MJB4 aligner
Aligner D (MA BA6 Gen4)	MA/BA aligner

Dry Etching

Etchers

Tool	Description
Oxford DRIE	Oxford System 100 Deep reactive-ion etcher
Oxford DRIE-ALE	Oxford Deep reactive-ion etcher and atomic-layer etcher.
Oxford III-V	Oxford PlasmaPro 100 Cobra III-V etcher
Oxford RIE	Oxford PlasmaPro 80 reactive ion etcher
XeF2 etcher	XeF2 etcher

Plasma cleaning / ashing

Tool	Description
O2 Plasma Asher
Tegal Plasma	Tegal 915 Plasma Strip
YES O2 Plasma	YES Engineering O2 Plasma

Dry etch equipment comparison

	Oxford III-V	Oxford RIE	Oxford DRIE	XeF2 etcher	YES O2 Plasma
Model	Oxford PlasmaPro 100 Cobra 180	Oxford PlasmaPro 80 RIE	Oxford System 100 Phoenix GP	Custom-built	CV200RFS(E)
Use case	Etching III-V materials	Etching dielectrics	Etching deep Si with Bosch process	Etching Si quickly and isotropically with high selectivity	Descum, photoresist stripping, or organic material removal
Allowed materials	InP, InAs, GaN, AlGaAs, InGaAsP, ITO, Si, SiC, MoS2, WSe, Graphene	SiO2, SiN, HfO2	Si, SiO2, SiN, Parylene, polyimide, LiNbO3, BCB	Si	Photoresist, graphene, CNT
Material restrictions	No exposed metals (except Cr) No deep etching polymers (>1 µm)	No exposed metals (except Cr) No deep etching polymers (>1 µm)	No exposed metals (except Cr)	None	None
Load lock	Yes		Yes
Substrate size	4" wafer clamp Smaller pieces may go onto carrier wafers 2″, 3″, 4″, 6″, 8″ wafers possible	Up to 200 mm wafers	4" wafer clamp Smaller pieces may go onto carrier wafers 2″, 3″, 4″, 6″, 8″ wafers possible	Up to 100 mm wafers	Up to 200 mm wafers
Ar	Yes	Yes	Yes
O2	Yes	Yes	Yes		Yes
CF4		Yes	Yes
CHF3		Yes	Yes
SF6	Yes	Yes	Yes
C4F8			Yes
CH4	Yes
H2	Yes
Cl2	Yes
BCl3	Yes
SiCl4	Yes
XeF2				Yes
Table RF power (max)	300W	300W	600W		1000W
ICP power (max)	1500W		3000W
He backside cooling	Yes		Yes
Table temperature	-120 to 200C	20C	20C	20C	Ambient - 250C
Endpoint detection	Horiba Jobin Yvon LEM G50	Horiba Jobin Yvon LEM G50

Metrology

Tool	Description
4-point Probe	Signatone 4-point probe
Dektak	Bruker DektakXT profilometer
Desktop SEM	Phenom ProX G6 Desktop Scanning Electron Microscope

Oxidation

Tool	Description
Oxide (lower)
Oxide (upper)

Packaging & Mechanical Tooling

Tool	Description
Ball & Wedge bonder	F&S Bondtec 53BDA Deep-access & Ball-Wedge bonder
Dicing Saw	DISCO Corp. DAD3350 Dicing Saw
Polisher	EQ Unipol-300 Mini (3") Automatic Grinder/ Polisher
Scribe Tool	LatticeAx 420 Cleaving System
Vacuum Sealer	Gramatech GVS2600R Vacuum Sealer

Testers

Tool	Description
Keithley S530	Keithley (Tektronix) S530 Parametric tester

Wet Process

Solvent fume hood (in Metrology bay)

Tool	Description
Heated ultrasonic bath
Hot plate

Acid fume hood left-side (in Etch bay)

Tool	Description

Acid fume hood right-side (in Etch bay)

Tool	Description

Resist fume hood

Tool	Description
Spinner 1	Laurell resist spinner (left side)
Spinner 2	Laurell resist spinner (right side)
Bake plate 1	Apogee bake plate
Bake plate 2	Apogee bake plate
Bake plate 3	Apogee bake plate
Bake plate 4	Apogee bake plate

Base and developer fume hood left-side (in Advanced Photo bay)

Tool	Description

Base and developer fume hood right-side (in Advanced Photo bay)

Tool	Description

EBL-use-only fume hood (in Photo bay)

Tool	Description
Headway spinner left	Headway resist spinner
Headway spinner right	Headway resist spinner
Torrey Pines Hot Plate left
Torrey Pines Hot Plate right
Ultrasonic heated bath