Annealing
| Tool
|
Description
|
| RTA
|
Rapid Thermal Annealer
|
Deposition
CVD (chemical vapor deposition)
| Tool
|
Description
|
| Veeco ALD
|
Atomic Layer Deposition
|
| Oxford PECVD
|
Plasma-enhanced chemical vapor deposition
|
PVD (physical vapor deposition)
| Tool
|
Substrate size
(up to diameter)
|
# of pockets
|
E-beam voltage
|
Deposition materials
|
Gases
|
Other features
|
Links
|
| Angstrom Evaporator
|
6"
|
4
|
10kV
|
Ti, Al, Al2O3
|
Ar, 5% O2 in Ar
|
- variable angle stage
- substrate rotation
- substrate heater
- ion mill for substrate cleaning
- load lock
|
SOP
|
| CHA Evaporator
|
6"
|
6 @ 15cc
|
10kV
|
Ti, Au, Pt, Pd, Cr, Ni and Ag
|
|
- Sweep controller
- motor-driven deposition shield
- 8kW heater array
- Lift-off fixturing
- substrate rotation
- substrate dome for twenty-two 100mm back loaded wafers
- Inficon IC/6 for thickness control
|
SOP
|
| KJL Evaporator
|
6"
|
4
|
5kV
|
Ti, Au, Pt, Pd, Cr, Ni and Ag
|
|
- substrate rotation
- source to substrate distance is approx. 15″ (381mm)
|
SOP,
how-to video
|
| Temescal Metal
|
|
|
|
|
|
Temescal e-beam evaporator
|
|
| Tool
|
Substrate size
|
# of sources
|
Sputter power
|
Deposition materials
|
Gases
|
Other features
|
Links
|
| KJL Sputter
|
6"
|
5 total, 4 DC, 1 RF/DC
|
- DC sputter power 500 W
- RF sputter power 300 W
|
Au, Pt, Ti, Al, W, Mo, Cu, SiO2, Al2O3, ITO
|
Ar, O2
|
- Target size: 2"
- Substrate rotation
|
SOP
|
Lithography
E-beam lithography
| Tool
|
Description
|
| Raith EBL
|
Raith e-beam lithography EBPG5150
|
Laser writing
| Tool
|
Description
|
| Heidelberg DWL
|
Heidelberg DWL 66+ (Direct Write Laser)
|
Dry Etching
See also: Dry etch equipment comparison.
Metrology
| Tool
|
Description
|
| 4-point Probe
|
Signatone 4-point probe
|
| Dektak
|
Bruker DektakXT profilometer
|
| Desktop SEM
|
Phenom ProX G6 Desktop Scanning Electron Microscope
|
| Ellipsometer
|
Thin film thickness measurement
|
| F20
|
Thin film thickness measurement
|
| Keithley S530
|
Keithley (Tektronix) S530 Parametric tester
|
Oxidation
Wet Process
Solvent fume hood (in Metrology bay)
| Tool
|
Description
|
| Heated ultrasonic bath
|
|
| Hot plate
|
|
Acid fume hood left-side (in Etch bay)
| Tool
|
Description
|
|
|
|
Acid fume hood right-side (in Etch bay)
| Tool
|
Description
|
|
|
|
Resist fume hood
| Tool
|
Description
|
| Spinner 1
|
Laurell resist spinner (left side)
|
| Spinner 2
|
Laurell resist spinner (right side)
|
| Bake plate 1
|
Apogee bake plate
|
| Bake plate 2
|
Apogee bake plate
|
| Bake plate 3
|
Apogee bake plate
|
| Bake plate 4
|
Apogee bake plate
|
Base and developer fume hood left-side (in Advanced Photo bay)
| Tool
|
Description
|
|
|
|
Base and developer fume hood right-side (in Advanced Photo bay)
| Tool
|
Description
|
|
|
|
EBL-use-only fume hood (in Photo bay)
| Tool
|
Description
|
| Headway spinner left
|
Headway resist spinner
|
| Headway spinner right
|
Headway resist spinner
|
| Torrey Pines Hot Plate left
|
|
| Torrey Pines Hot Plate right
|
|
| Ultrasonic heated bath
|
|