Tools menu: Difference between revisions

From USC Nanofab Wiki
Jump to navigation Jump to search
Undo revision 594 by Chandanr (talk)
Tag: Undo
Update
Line 13: Line 13:
* [[#Wet Process|Wet Process]]
* [[#Wet Process|Wet Process]]
|}
|}
|
== Anneal & Furnace ==
== Anneal & Furnace ==
* [[RTA (Rapid Thermal Annealer)]]
* [[RTA (Rapid Thermal Annealer)]]

Revision as of 16:59, 2 February 2026


Tool Categories

Anneal & Furnace

Deposition

CVD (Chemical Vapor Deposition)

PVD (Physical Vapor Deposition)

Dry Etching & Plasma Cleaning

Etchers

Plasma Cleaning / Ashing

Lithography

E-beam and Laser

UV Mask Aligners

Metrology

Assorted Metrology

Microscopes

Packaging & Mechanical Tooling

Wafer and Die Processing

PCB Processing

Wet Process

Fume Hoods & Stations

  • Acid Fume Hood – Left (Etch bay) – Piranha & Nanostrip allowed
    • Imtec Accubath (Acid left)
    • Quick-dump-rinse tank (QDR)
    • DI water tap
    • N2 gun
  • Acid Fume Hood – Right (Etch bay) – No Piranha/Nanostrip
  • Base & Developer Fume Hood – Left (Advanced Photo bay)
  • Base & Developer Fume Hood – Right (Advanced Photo bay)