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{| class="wikitable" style="width:max-content;" | {| class="wikitable" style="width:max-content;" | ||
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* [[#Dry Etching & Plasma Cleaning|Dry Etching & Plasma Cleaning]] | * [[#Dry Etching & Plasma Cleaning|Dry Etching & Plasma Cleaning]] | ||
* [[#Lithography|Lithography]] | * [[#Lithography|Lithography]] | ||
* [[#Metrology|Metrology]] | * [[#Metrology and testing|Metrology and testing]] | ||
* [[#Packaging & Mechanical Tooling|Packaging & Mechanical Tooling]] | * [[#Packaging & Mechanical Tooling|Packaging & Mechanical Tooling]] | ||
* [[#PCB Processing|PCB Processing]] | * [[#PCB Processing|PCB Processing]] | ||
* [[#Wet Process|Wet Process]] | * [[#Wet Process|Wet Process]] | ||
|} | |} | ||
== Anneal & Furnace == | == Anneal & Furnace == | ||
* [[RTA (Rapid Thermal Annealer)]] | * [[RTA (Rapid Thermal Annealer)]] | ||
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== Deposition == | == Deposition == | ||
=== CVD (Chemical Vapor Deposition) === | === CVD (Chemical Vapor Deposition) === | ||
* [[Oxford PECVD]] | * [[Oxford PECVD]] | ||
| Line 35: | Line 32: | ||
== Dry Etching & Plasma Cleaning == | == Dry Etching & Plasma Cleaning == | ||
=== Etchers === | === Etchers === | ||
* [[Oxford DRIE]] | * [[Oxford DRIE]] | ||
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== Lithography == | == Lithography == | ||
=== E-beam and Laser === | === E-beam and Laser === | ||
* [[Raith EBL]] | * [[Raith EBL]] | ||
| Line 60: | Line 55: | ||
* [[Aligner D (MA BA6 Gen4)]] | * [[Aligner D (MA BA6 Gen4)]] | ||
== Metrology == | == Metrology and testing == | ||
=== Assorted Metrology === | === Assorted Metrology === | ||
* [[4-point Probe]] | * [[4-point Probe]] | ||
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* [[Nikon SMZ-10A optical microscope]] | * [[Nikon SMZ-10A optical microscope]] | ||
* [[Nikon optical microscope]] | * [[Nikon optical microscope]] | ||
=== Electrical Characterization === | |||
* [[Electroglas 4080X]] – Automated wafer prober | |||
* [[Keithley S530 Parametric Test System]] – Parametric analyzer | |||
== Packaging & Mechanical Tooling == | == Packaging & Mechanical Tooling == | ||
=== Wafer and Die Processing === | === Wafer and Die Processing === | ||
* [[Ball & Wedge bonder]] | * [[Ball & Wedge bonder]] | ||
| Line 91: | Line 88: | ||
== Wet Process == | == Wet Process == | ||
=== Fume Hoods & Stations === | === Fume Hoods & Stations === | ||
* Solvent Fume Hood (Metrology bay) | * Solvent Fume Hood (Metrology bay) | ||
** [[Heated ultrasonic bath]] (Solvent hood) | ** [[Heated ultrasonic bath]] (Solvent hood) | ||
| Line 99: | Line 94: | ||
** Solvent drains | ** Solvent drains | ||
** N2 sprayers | ** N2 sprayers | ||
* Acid Fume Hood – Left (Etch bay) – Piranha & Nanostrip allowed | * Acid Fume Hood – Left (Etch bay) – Piranha & Nanostrip allowed | ||
** [[Imtec Accubath]] (Acid left) | ** [[Imtec Accubath]] (Acid left) | ||
| Line 105: | Line 99: | ||
** DI water tap | ** DI water tap | ||
** N2 gun | ** N2 gun | ||
* Acid Fume Hood – Right (Etch bay) – No Piranha/Nanostrip | * Acid Fume Hood – Right (Etch bay) – No Piranha/Nanostrip | ||
** [[Imtec Accubath]] (Acid right) | ** [[Imtec Accubath]] (Acid right) | ||
| Line 112: | Line 105: | ||
** DI water tap | ** DI water tap | ||
** N2 sprayer | ** N2 sprayer | ||
* Resist Fume Hood (Advanced Photo bay) | * Resist Fume Hood (Advanced Photo bay) | ||
** [[Laurell Spinner]] (left & right) | ** [[Laurell Spinner]] (left & right) | ||
** [[Apogee Bake Plate]] (1–4) | ** [[Apogee Bake Plate]] (1–4) | ||
* Base & Developer Fume Hood – Left (Advanced Photo bay) | * Base & Developer Fume Hood – Left (Advanced Photo bay) | ||
** [[Imtec Accubath]] (Developer left) | ** [[Imtec Accubath]] (Developer left) | ||
| Line 123: | Line 114: | ||
** DI water tap | ** DI water tap | ||
** N2 sprayer | ** N2 sprayer | ||
* Base & Developer Fume Hood – Right (Advanced Photo bay) | * Base & Developer Fume Hood – Right (Advanced Photo bay) | ||
** [[Imtec Accubath]] (Developer right) | ** [[Imtec Accubath]] (Developer right) | ||
| Line 130: | Line 120: | ||
** DI water tap | ** DI water tap | ||
** N2 sprayer | ** N2 sprayer | ||
* E-beam Resist Fume Hood (Photo bay) | * E-beam Resist Fume Hood (Photo bay) | ||
** [[Headway Spinner]] (left & right) | ** [[Headway Spinner]] (left & right) | ||
Latest revision as of 13:33, 17 February 2026
Tool Categories |
Anneal & Furnace
- RTA (Rapid Thermal Annealer)
- Cascade Tek vacuum oven
- Blue M furnace big
- Blue M furnace little
- Narco vacuum oven
Deposition
CVD (Chemical Vapor Deposition)
PVD (Physical Vapor Deposition)
- Angstrom Evaporator
- CHA Evaporator
- KJL Evaporator
- Temescal Metal e-beam evaporator (Not in service)
- KJL Sputter
Dry Etching & Plasma Cleaning
Etchers
- Oxford DRIE
- Oxford DRIE-ALE (being commissioned)
- Oxford III-V
- Oxford RIE
- XeF2 etcher
Plasma Cleaning / Ashing
- Tegal O2 Plasma Asher
- Tegal Plasma (not in operation)
- YES O2 Plasma
Lithography
E-beam and Laser
UV Mask Aligners
Metrology and testing
Assorted Metrology
Microscopes
- Desktop SEM
- Nikon LV 150 optical microscope
- Max ERB optical microscope
- Zeiss optical microscope
- Nikon SMZ-10A optical microscope
- Nikon optical microscope
Electrical Characterization
- Electroglas 4080X – Automated wafer prober
- Keithley S530 Parametric Test System – Parametric analyzer
Packaging & Mechanical Tooling
Wafer and Die Processing
PCB Processing
Wet Process
Fume Hoods & Stations
- Solvent Fume Hood (Metrology bay)
- Heated ultrasonic bath (Solvent hood)
- Torrey Pines hot plate (Solvent hood)
- Solvent drains
- N2 sprayers
- Acid Fume Hood – Left (Etch bay) – Piranha & Nanostrip allowed
- Imtec Accubath (Acid left)
- Quick-dump-rinse tank (QDR)
- DI water tap
- N2 gun
- Acid Fume Hood – Right (Etch bay) – No Piranha/Nanostrip
- Imtec Accubath (Acid right)
- Torrey Pines hot plate (Acid right – left & right units)
- Quick-dump-rinse tank (QDR)
- DI water tap
- N2 sprayer
- Resist Fume Hood (Advanced Photo bay)
- Laurell Spinner (left & right)
- Apogee Bake Plate (1–4)
- Base & Developer Fume Hood – Left (Advanced Photo bay)
- Imtec Accubath (Developer left)
- Torrey Pines hot plate (Developer left)
- Quick-dump-rinse tank (QDR)
- DI water tap
- N2 sprayer
- Base & Developer Fume Hood – Right (Advanced Photo bay)
- Imtec Accubath (Developer right)
- Torrey Pines hot plate (Developer right)
- Quick-dump-rinse tank (QDR)
- DI water tap
- N2 sprayer
- E-beam Resist Fume Hood (Photo bay)
- Headway Spinner (left & right)
- Apogee Hot Plate (left & right – ebeam)
- Ultrasonic heated bath
- Torrey Pines hot plate / stirrer (ebeam hood)