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=== Electrical Characterization === | === Electrical Characterization === | ||
* [[ | * [[Electroglas 4080X]] – Automated wafer prober (200 mm capable, hot chuck option, vision alignment) | ||
* [[Keithley S530 Parametric Test System]] – Parametric analyzer (DC I-V, C-V, high-voltage options for power devices) | |||
== Packaging & Mechanical Tooling == | == Packaging & Mechanical Tooling == | ||
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** DI water tap | ** DI water tap | ||
** N2 sprayer | ** N2 sprayer | ||
* E-beam Resist Fume Hood (Photo bay) | * E-beam Resist Fume Hood (Photo bay) | ||
** [[Headway Spinner]] (left & right) | ** [[Headway Spinner]] (left & right) | ||
Revision as of 13:31, 17 February 2026
Tool Categories |
Anneal & Furnace
- RTA (Rapid Thermal Annealer)
- Cascade Tek vacuum oven
- Blue M furnace big
- Blue M furnace little
- Narco vacuum oven
Deposition
CVD (Chemical Vapor Deposition)
PVD (Physical Vapor Deposition)
- Angstrom Evaporator
- CHA Evaporator
- KJL Evaporator
- Temescal Metal e-beam evaporator (Not in service)
- KJL Sputter
Dry Etching & Plasma Cleaning
Etchers
- Oxford DRIE
- Oxford DRIE-ALE (being commissioned)
- Oxford III-V
- Oxford RIE
- XeF2 etcher
Plasma Cleaning / Ashing
- Tegal O2 Plasma Asher
- Tegal Plasma (not in operation)
- YES O2 Plasma
Lithography
E-beam and Laser
UV Mask Aligners
Metrology and testing
Assorted Metrology
Microscopes
- Desktop SEM
- Nikon LV 150 optical microscope
- Max ERB optical microscope
- Zeiss optical microscope
- Nikon SMZ-10A optical microscope
- Nikon optical microscope
Electrical Characterization
- Electroglas 4080X – Automated wafer prober (200 mm capable, hot chuck option, vision alignment)
- Keithley S530 Parametric Test System – Parametric analyzer (DC I-V, C-V, high-voltage options for power devices)
Packaging & Mechanical Tooling
Wafer and Die Processing
PCB Processing
Wet Process
Fume Hoods & Stations
- Solvent Fume Hood (Metrology bay)
- Heated ultrasonic bath (Solvent hood)
- Torrey Pines hot plate (Solvent hood)
- Solvent drains
- N2 sprayers
- Acid Fume Hood – Left (Etch bay) – Piranha & Nanostrip allowed
- Imtec Accubath (Acid left)
- Quick-dump-rinse tank (QDR)
- DI water tap
- N2 gun
- Acid Fume Hood – Right (Etch bay) – No Piranha/Nanostrip
- Imtec Accubath (Acid right)
- Torrey Pines hot plate (Acid right – left & right units)
- Quick-dump-rinse tank (QDR)
- DI water tap
- N2 sprayer
- Resist Fume Hood (Advanced Photo bay)
- Laurell Spinner (left & right)
- Apogee Bake Plate (1–4)
- Base & Developer Fume Hood – Left (Advanced Photo bay)
- Imtec Accubath (Developer left)
- Torrey Pines hot plate (Developer left)
- Quick-dump-rinse tank (QDR)
- DI water tap
- N2 sprayer
- Base & Developer Fume Hood – Right (Advanced Photo bay)
- Imtec Accubath (Developer right)
- Torrey Pines hot plate (Developer right)
- Quick-dump-rinse tank (QDR)
- DI water tap
- N2 sprayer
- E-beam Resist Fume Hood (Photo bay)
- Headway Spinner (left & right)
- Apogee Hot Plate (left & right – ebeam)
- Ultrasonic heated bath
- Torrey Pines hot plate / stirrer (ebeam hood)